Key Advantages
Substrate Material Properties
|
Parameter |
H-K9L ( N-BK7) |
JGS1 Fused Silica |
Sapphire ( Al₂O₃) |
|
Transmission Range |
350-2000 nm |
185-2500 nm |
170-5500 nm |
|
Refractive Index @632.8 nm |
1.5168 |
1.457 |
no 1.75 / ne 1.74 |
|
Density (g/cm3) |
2.51 |
2.20 |
3.97 |
|
CTE |
7.1 |
0.55 |
5.6 |
|
Thermal Conductivity (W/m·K) |
1.1 |
1.38 |
27.21 |
|
Main Filter Advantage |
Cost-effective, general VIS-NIR |
Low CTE, UV-grade, high-power tolerant |
High hardness, high thermal conduction, harsh env. |
Processing Specifications
|
Parameter |
Regular |
High Precision |
|
Substrate Options |
H-K9L /JGS1 / Sapphire |
H-K9L /JGS1 / Sapphire |
|
Diameter (Φ) Tolerance |
±0.1 mm |
±0.02 mm |
|
Thickness Tolerance |
±0.1 mm |
+0 / -0.01 mm |
|
Surface Flatness (PV) |
λ/4 @632.8 nm |
λ/10 @632.8 nm |
|
Parallelism |
<1′ |
<30″ |
|
Surface Quality |
60-40 |
40-20 |
|
Coating Type |
Hard dielectric, ion-assisted |
Hard dielectric, IBS |
|
Clear Aperture |
>90% |
>95% |
|
Operating Temperature |
−40 to +85 °C |
−40 to +105 °C |
Application Fields